Poly(n-butyl α-cyanoacrylate): A highly sensitive and high contrast resist for electron-beam and X-ray lithography

Autor:	Brigitte Serre, Jean-Claude Dubois, Evelyne Datamanti, Louis Giral, Claude Montginoul, Armand Eranian, François Schué
Rok vydání:	1987
Předmět:	chemistry.chemical_classification Materials science Scanning electron microscope General Engineering Analytical chemistry Polymer chemistry Polymerization Resist Cathode ray General Materials Science X-ray lithography Ionic polymerization Lithography
Zdroj:	British Polymer Journal. 19:353-359
ISSN:	0007-1641
DOI:	10.1002/pi.4980190319
Popis:	High molecular weight poly(n-butyl α-cyanoacrylate) has been obtained by zwitterionic polymerization. This polymer exhibits sensitivity to an electron beam (20 keV) about 25 times higher than that of PMMA, with a contrast of 3, and a sensitivity to X-rays (λ = 13−34 A) about 15 times higher than that of PMMA, with a contrast of 2 3.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::ac4c1919aacf63082cae9dabb41b223b https://doi.org/10.1002/pi.4980190319 Zobrazit plný text záznamu Plný text