On the Analysis of Surfaces and Interfaces by LEIS, AES and SIMS
Autor: | P. A. J. Ackermans, H. H. Brongersma, L. J. Vijgen, W. C. v.d. Vleuten, H. J. van Daal |
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Rok vydání: | 1987 |
Předmět: | |
Zdroj: | Seventh E.C. Photovoltaic Solar Energy Conference ISBN: 9789401081986 |
DOI: | 10.1007/978-94-009-3817-5_199 |
Popis: | A comparison will be made of three surface analysis techniques, viz. LEIS (NODUS), SIMS and AES, applied to an As doped Si02/Si interface. The purpose is to determine the profiles of 0, Si and As across the interface. These profiles will be made while sputtering either by primary He+ ions (LEIS) or by Ar+ ions (AES and SIMS). |
Databáze: | OpenAIRE |
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