Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

Autor: Peter De Schepper, David Rio, Werner Gillijns, Joost Bekaert, Michael Greer, Michael Kocsis, Maxence Delorme, Anita Fumar-Pici, Adam Lyons, Sook Lee, Danilo De Simone, Wallow Thomas I, Jason K. Stowers
Rok vydání: 2017
Předmět:
Zdroj: SPIE Proceedings.
ISSN: 0277-786X
DOI: 10.1117/12.2260441
Popis: Inpria has developed a directly patternable metal oxide hard-mask as a high-resolution photoresist for EUV lithography1. In this contribution, we describe a Tachyon 2D OPC full-chip model for an Inpria resist as applied to an N7 BEOL block mask application.
Databáze: OpenAIRE