| Autor: |
P. Chandramohan, Feby Jose, Baldev Raj, R. Ramaseshan, M.P. Srinivasan, V. Ganesan, Sitaram Dash, Deepti Jain, S. Tripura Sundari, A.K. Tyagi |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
Materials Chemistry and Physics. 130:1033-1037 |
| ISSN: |
0254-0584 |
| DOI: |
10.1016/j.matchemphys.2011.07.083 |
| Popis: |
TiN and Ti1−xAlxN thin films with different aluminum concentrations (x = 0.35, 0.40, 0.55, 0.64 and 0.81) were synthesized by reactive magnetron co-sputtering technique. The structure, surface morphology and optical properties were examined using Grazing Incidence X-ray Diffraction (GIXRD), Atomic Force Microscopy (AFM), Raman spectroscopy and spectroscopic ellipsometry, respectively. The structure of the films were found to be of rocksalt type (NaCl) for x = 0.0–0.64 and X-ray amorphous for x = 0.81. AFM topographies show continuous mound like structure for the films of x between 0.0 and 0.64, whereas the film with x = 0.81 showed smooth surface with fine grains. Micro-Raman spectroscopic studies indicate structural phase separation of AlN from TiAlN matrix for x > 0.40. Ti1−xAlxN has the tendency for decomposition with the increase of Al concentration whereas c-TiN and hcp-AlN are stable mostly. The optical studies carried out by spectroscopic ellipsometry measurements showed a change from metallic to insulating behavior with the increase in x. These films are found to be an insulator beyond x = 0.81. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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