Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench
| Autor: | Marc Segers, Didier Normand, E. Caprin, T. Ceccotti, M. Schmidt, O. Sublemontier, M. Bougeard |
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| Rok vydání: | 2002 |
| Předmět: |
Test bench
Chemistry business.industry Extreme ultraviolet lithography Energy conversion efficiency chemistry.chemical_element Injector Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics Xenon law Optoelectronics Electrical and Electronic Engineering Photolithography business Lithography |
| Zdroj: | Microelectronic Engineering. :139-144 |
| ISSN: | 0167-9317 |
| Popis: | Within PREUVE, our group developed an EUV source that will meet α-tool specifications in 2002. With this aim, a laser-produced plasma source was built that uses a dense and confined xenon jet target. This device assures high conversion efficiency and low debris flux which are necessary for future extreme ultraviolet lithography. Our technical solution is based on a specific target injector design and the use of well adapted nozzle materials. After injection, the xenon is recycled and purified to reach a low cost of operation. Our ELSA source will allow 2 years full operation of the BEL lithography test bench. |
| Databáze: | OpenAIRE |
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