Analysis of Resist Removal Phenomenon Using Laser Irradiation
| Autor: | Hirouki Kuramae, Yuji Umeda, Ryosuke Nakamura, Hideo Horibe, Takashi Nishiyama, Singo Tsujimoto, Takayuki Yamashiro, Tomosumi Kamimura, Kosuke Nuno |
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| Rok vydání: | 2017 |
| Předmět: |
Materials science
Polymers and Plastics Organic Chemistry 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology Laser 01 natural sciences 0104 chemical sciences law.invention Stress (mechanics) Resist law Materials Chemistry Irradiation Composite material 0210 nano-technology |
| Zdroj: | Journal of Photopolymer Science and Technology. 30:291-295 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.30.291 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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