High-quality plasma-assisted polishing of aluminum nitride ceramic
| Autor: | Kentaro Kawai, Xu Yang, Kazuya Yamamura, Kenta Arima, Rongyan Sun |
|---|---|
| Rok vydání: | 2020 |
| Předmět: |
0209 industrial biotechnology
Materials science Mechanical Engineering Abrasive chemistry.chemical_element Polishing 02 engineering and technology Nitride Industrial and Manufacturing Engineering 020303 mechanical engineering & transports 020901 industrial engineering & automation 0203 mechanical engineering chemistry Aluminium visual_art Slurry visual_art.visual_art_medium Surface modification Ceramic Composite material Layer (electronics) |
| Zdroj: | CIRP Annals. 69:301-304 |
| ISSN: | 0007-8506 |
| DOI: | 10.1016/j.cirp.2020.04.096 |
| Popis: | Aluminum nitride (AlN) easily reacts with water when polished using an aqueous slurry. Moreover, grains tend to easily shed off of the AlN surface since it is a sintered material. Thus, obtaining a smooth AlN surface by traditional mechanical polishing techniques is challenging. Herein, we demonstrate plasma-assisted polishing (PAP) that relies on surface modification by plasma irradiation and removal of the modified layer by ultra-low pressure. After CF4 plasma irradiation, AlN was modified to AlF3, and its modified layer was removed using a diamond abrasive. The material removal rate increased twice by CF4 plasma irradiation compared with that without it. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect