Diffusion in the Bα-Fe system and compound formation between electron gun deposited boron thin films and steel substrate
| Autor: | Joshua Pelleg, M. Judelewicz |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Diffraction
Diffusion barrier Chemistry Annealing (metallurgy) Metals and Alloys Analytical chemistry Mineralogy chemistry.chemical_element Surfaces and Interfaces Activation energy Surfaces Coatings and Films Electronic Optical and Magnetic Materials Auger Materials Chemistry Thin film Boron Boriding |
| Zdroj: | Thin Solid Films. 215:35-41 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(92)90697-a |
| Popis: | Boriding of steels can be performed by electron gun deposition of boron films and subsequent low temperature annealing. Already for annealing at 973 K for 900 s borides are formed as indicated by X-ray diffraction. The borides are Fe 2 B and FeB. The formation of FeB contrary to expectation on the basis of phase relations in the FeB system can be explained by the fact that Fe 2 B acts as a diffusion barrier. Hence the supply of boron for the continued growth of Fe 2 B is reduced. Boron atoms accumulating behind the layer of Fe 2 B react with it, forming FeB at the outside region. At the lower temperatures interdiffusion between boron and iron occurred, and effective diffusion coefficients were determined from Auger depth profiles. The effective diffusion parameters derived on the basis of the Auger analysis are 218.4 kJ mol −1 and 3 × 10 −5 m 2 s −1 for the activation energy and the pre-exponential factor respectively. |
| Databáze: | OpenAIRE |
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