Effects of nitrogen and oxygen partial pressure on the structural and optical properties of ZnO:N thin films prepared by magnetron sputtering
| Autor: | Yang Yu, Peipei Zhou, Linao Zhang, Zhi Wang, Yinglan Li, Huiping Lu, Haonan Liu |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Mechanical Engineering Inorganic chemistry chemistry.chemical_element 02 engineering and technology Partial pressure Sputter deposition 021001 nanoscience & nanotechnology Condensed Matter Physics Microstructure 01 natural sciences Nitrogen Oxygen Absorption edge chemistry Chemical engineering Mechanics of Materials Sputtering 0103 physical sciences General Materials Science Thin film 0210 nano-technology |
| Zdroj: | Materials Letters. 165:123-126 |
| ISSN: | 0167-577X |
| Popis: | Nitrogen doped ZnO films were prepared by magnetron sputtering. We studied the influence of nitrogen partial pressure pn and oxygen partial pressure po on the microstructure, morphology and optical properties of the thin films. The results show that different defects influence the structure and optical behavior of the films. Doping-related tensile stress turns compressive, owing to a different N-doping form in the films. Red-shift of absorption edge was observed with increasing pn and decreasing po. Band-gap narrowing is improved by increasing nitrogen substitute and oxygen vacancies. |
| Databáze: | OpenAIRE |
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