| Autor: |
Kyohei Koike, Peter Choi, Stijn Schoofs, Tae Kwon Jee, Carlos Fonseca, David Rio, Hidetami Yaegashi, Yu-Cheng Tsai, Vadim Timoshkov |
| Rok vydání: |
2017 |
| Předmět: |
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| Zdroj: |
International Conference on Extreme Ultraviolet Lithography 2017. |
| Popis: |
Both local variability and optical proximity correction (OPC) errors are big contributors to the edge placement error (EPE) budget which is closely related to the device yield. The post-litho contact hole healing will be demonstrated to meet after-etch local variability specifications using a low dose, 30mJ/cm2 dose-to-size, positive tone developed (PTD) resist with relevant throughput in high volume manufacturing (HVM). The total local variability of the node 5nm (N5) contact holes will be characterized in terms of local CD uniformity (LCDU), local placement error (LPE), and contact edge roughness (CER) using a statistical methodology. The CD healing process has complex etch proximity effects, so the OPC prediction accuracy is challenging to meet EPE requirements for the N5. Thus, the prediction accuracy of an after-etch model will be investigated and discussed using ASML Tachyon OPC model. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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