APPLICATION OF BRIGHT ION BEAMS FOR ION IMPLANTATION USED IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES

Autor:	D. R. Swenson
Rok vydání:	2000
Předmět:	Materials science Ion implantation Ion beam business.industry Optoelectronics Semiconductor device Atomic physics business Focused ion beam Ion
Zdroj:	The Physics of High Brightness Beams.
DOI:	10.1142/9789812792181_0039
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::aaf659cca103d01d23a8f266e95d491d https://doi.org/10.1142/9789812792181_0039 Zobrazit plný text záznamu