| Autor: |
J.W. Digby, J. Martyn Chamberlain, N. J. Cronin, S.R. Davies, David Paul Steenson, G.M. Parkhurst, John W. Bowen, Christopher Collins, Robert E. Miles, H. Kazemi, R. D. Pollard |
| Rok vydání: |
1998 |
| Předmět: |
|
| Zdroj: |
Millimeter and Submillimeter Waves IV. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.331184 |
| Popis: |
A new technique is reported for micro-machining millimeter and submillimeter-wave rectangular waveguide components using an advanced thick film UV photoresist known as EPONTM SU-8. The recent introduction of this resist has been of great interest to the millimeter-wave and terahertz micro-machining communities, as it is capable of producing features up to 1 mm in height with very high aspect ratios in only a single UV exposure. It therefore represents a possible low-cost alternative to the LIGA process. S-parameter measurements on the new rectangular waveguides show that they achieve lower loss than those produced using other on-chip fabrication techniques, they have highly accurate dimensions, are physically robust, and cheap and easy to manufacture. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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