Research on High Micro Element Density Silicon Photomultiplier Based on Epitaxial Quenching Resistance

Autor:	李佰成 Li Bai-cheng, 王瑞恒 Wang Rui-heng, 梁琨 Liang Kun, 杨茹 Yang Ru, 贾建权 Jia Jian-quan, 韩德俊 Han De-jun, 江加丽 Jiang Jia-li
Rok vydání:	2017
Předmět:	Quenching Silicon photomultiplier Materials science 010308 nuclear & particles physics business.industry 0103 physical sciences Optoelectronics 010306 general physics business Epitaxy 01 natural sciences Atomic and Molecular Physics and Optics
Zdroj:	ACTA PHOTONICA SINICA. 46:404001
ISSN:	1004-4213
DOI:	10.3788/gzxb20174604.0404001
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::aa1698a1aa79e90d6ce4b105d1d59b89 https://doi.org/10.3788/gzxb20174604.0404001 Zobrazit plný text záznamu