The calculation of the reflection coefficients by analyzing resistivity data of the Ni–Si silicide films formed at 850°C by RTA
Autor: | N. Artunç, G. Utlu |
---|---|
Rok vydání: | 2014 |
Předmět: |
Work (thermodynamics)
Materials science Condensed matter physics Scattering Atmospheric temperature range Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Reflection (mathematics) chemistry Electrical resistivity and conductivity Silicide Electrical and Electronic Engineering Thin film Reflection coefficient |
Zdroj: | Microelectronic Engineering. 113:86-92 |
ISSN: | 0167-9317 |
DOI: | 10.1016/j.mee.2013.07.019 |
Popis: | The total electrical resistivity measurements of the Ni-Si silicide films, with thicknesses of 37-400nm have been carried out as a function of temperature and film thickness in a wide temperature range of 100-900K. The temperature-dependence of the total resistivity of the films shows unusual behavior. The total resistivity of the Ni-Si silicide films in this work increases linearly with temperature up to a T"m temperature, thereafter decreases rapidly and finally reaches zero. We have shown that in the temperature range of (100-T"m)K, linear variation of resistivity of the films with temperature has been caused from both grain-boundary and electron-phonon scattering, dominating simultaneously. That is why, resistivity data could have been analyzed in terms of the Mayadas-Shatzkes (M-S) model. R reflection coefficients have been calculated by analyzing resistivity data of the films using M-S model. Based on our analysis, for a given temperature R increases with decreasing thickness, whereas it is almost constant over the three-thickness ranges, defined as 400-162nm, 105-60nm and 42-37nm, over which silicide films have almost same phases. For room temperature, theoretical and experimental reflection coefficients are calculated to be R"t"h=0.75, R"t"h=0.92, R"t"h=0.96 and R"e"x"p=0.85, R"e"x"p=0.93, R"e"x"p=0.96 by taking an average over the three-thickness ranges, respectively. |
Databáze: | OpenAIRE |
Externí odkaz: |