Surface recombination velocity on wet-cleaned silicon wafers using heterodyne lock-in ca rrierography imaging: measurement uniqueness investigation
| Autor: | Qiming Sun, Andreas Mandelis, Junyan Liu, Robert H. Pagliaro, Alexander Melnikov, Peng Song, Xiaogang Sun |
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| Rok vydání: | 2020 |
| Předmět: |
010302 applied physics
Recombination velocity Heterodyne Surface (mathematics) Materials science business.industry 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Electronic Optical and Magnetic Materials Characterization (materials science) Direct-conversion receiver Semiconductor 0103 physical sciences Materials Chemistry Optoelectronics Radiometry Wafer Electrical and Electronic Engineering 0210 nano-technology business |
| Zdroj: | Semiconductor Science and Technology. 35:055013 |
| ISSN: | 1361-6641 0268-1242 |
| DOI: | 10.1088/1361-6641/ab7844 |
| Popis: | Characterization of semiconductor surface quality is important for evaluating the surface preparation methods. In this work, three wet-cleaned silicon wafers with different surface conditions were inspected using heterodyne lock-in carrierography (HeLIC) imaging simultaneously with homodyne photocarrier radiometry (HoPCR). The surface recombination velocity (SRV) was measured at various queue times after the wet-clean treatment using HeLIC and was found to be consistent with values obtained using HoPCR. The results show that HeLIC can provide a reliable quantitative imaging tool for evaluating the surface conditions of wet-cleaned silicon wafers. |
| Databáze: | OpenAIRE |
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