Trapping and release of implanted D/H ions in fused silica

Autor:	G.W. Arnold, B.L. Doyle
Rok vydání:	1982
Předmět:	Elastic recoil detection Ion implantation Deuterium Chemistry Impurity Annealing (metallurgy) Radiochemistry General Engineering Analytical chemistry Activation energy Fourier transform infrared spectroscopy Ion
Zdroj:	Nuclear Instruments and Methods in Physics Research. 194:491-495
ISSN:	0167-5087
DOI:	10.1016/0029-554x(82)90570-5
Popis:	Elastic recoil detection techniques have been used to measure hydrogen isotope profiles in fused silica implanted with 20 keV H and/or D ions. Saturation is obtained for both H and D implantations at concentrations of 2.1 x 10/sup 21/ ions/cm/sup 3/, in good agreement with results of gas loading experiments. FTIR measurements indicate that most of the implanted H bonds in the form of OH. Theoretical analyses using the local mixing model (LMM) of H-trapping provide a good fit to the saturation behavior and subsequent H movement toward the surface. Isochronal annealing shows that both H and D are released in a single stage centered about 550/sup 0/C. The best theoretical fit is for a 1.9 eV H-trap activation energy.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a94e5c583ac777191249cef9083dfd06 https://doi.org/10.1016/0029-554x(82)90570-5 Zobrazit plný text záznamu