Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Autor: | Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka |
---|---|
Rok vydání: | 2003 |
Zdroj: | SPIE Proceedings. |
ISSN: | 0277-786X |
DOI: | 10.1117/12.504212 |
Databáze: | OpenAIRE |
Externí odkaz: |