UV-NIL with working stamps made from Ormostamp

Autor:	Anna Klukowska, Ch. Ebm, Rainer Schöftner, Hans Leichtfried, Michael Mühlberger, E. Platzgummer, Iris Bergmair, Gabi Grützner, H. Loeschner, Anett Kolander
Rok vydání:	2009
Předmět:	Materials science law Nanotechnology Electrical and Electronic Engineering Photolithography Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nanoimprint lithography law.invention Design for manufacturability
Zdroj:	Microelectronic Engineering. 86:691-693
ISSN:	0167-9317
DOI:	10.1016/j.mee.2008.11.020
Popis:	The use of working stamps for nanoimprint lithography is highly interesting for a number of reasons like an increased lifetime and often a better manufacturability of the master stamp. We present results on the use of Ormostamp as a material for working stamps in UV-NIL. Imprinting properties and anti-sticking treatments have been investigated. So far a minimum feature size of 50nm can be achieved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a8d7e4f28980fcab15cd17cad48dca51 https://doi.org/10.1016/j.mee.2008.11.020 Zobrazit plný text záznamu Full Text from ScienceDirect