| Autor: |
Alden Acheta, Adam R. Pawloski, Franklin D. Kalk, Harry J. Levinson, Christopher A. Spence, Christian Chovino, Yunfei Deng, Eric Johnstone, Laurent Dieu, Bruno La Fontaine |
| Rok vydání: |
2003 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
The impact of wafer and reticle anti-reflection coatings (ARCs) on the aerial image of ArF lithography scanners is measured using contrast curves and critical dimension (CD) analysis. The importance of a good ARC layer on the wafer appears to be greater than that of the reticle-ARC. In fact, for state-of-the-art lithography scanners, the influence of the reticle-ARC is practically undetectable. Numerical simulations are used to understand the relative contributions of the lens, the wafer and the reticle to the overall loss of contrast associated with non-optimized ARCs. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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