Properties of low-refractive-index films obtained by the close-spaced vapor transport technique under the sublimation of graphite in a quasi-closed volume

Autor:	N. A. Semenenko, V. S. Khomchenko, V. P. Sobolevskii, G. P. Ol’khovik, N. V. Sopinskii, A. A. Evtukh, A. K. Savin, O. S. Litvin
Rok vydání:	2011
Předmět:	Field electron emission Carbon film Materials science Physics and Astronomy (miscellaneous) Silicon chemistry Ellipsometry Analytical chemistry Surface roughness chemistry.chemical_element Sublimation (phase transition) Graphite Refractive index
Zdroj:	Technical Physics. 56:1665-1669
ISSN:	1090-6525 1063-7842
DOI:	10.1134/s1063784211110259
Popis:	The properties of low-refractive-index carbon films obtained by close-spaced vapor transport at graphite sublimation are studied. The optical properties of the films are investigated by monochromatic multiple-angle ellipsometry, and their morphology is examined by AFM. It is found that the films have a columnar structure with a background surface roughness of about 1 nm. In addition, the surface of the film contains islands up to 50 nm in height with a footprint of ≈200 nm. A low-refractive-index carbon film deposited by close-spaced vapor transport on silicon tips is found to decrease the field emission threshold and drastically raise the current.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a8687e2d38a927f22980113779a9e07c https://doi.org/10.1134/s1063784211110259 Zobrazit plný text záznamu Plný text ve formátu PDF