Mitigation of Copper Galvanic Corrosion by Dry Etch and Wet Clean Optimization : YE: Yield Enhancement/Learning

Autor:	Allen Osaheni, Daniel Jaeger, Peter Konrad, William Chong, PiJeng Khor, Steven Soss, Owen Hu
Rok vydání:	2023
Zdroj:	2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
DOI:	10.1109/asmc57536.2023.10121129
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a85d53af24a27ac454b6de0d5be702ea https://doi.org/10.1109/asmc57536.2023.10121129 Zobrazit plný text záznamu