Chemical Kinetics Models for Semiconductor Processing

Autor:	Michael E. Coltrin, J.F. Grcar, Ellen Meeks, Robert J. Kee, J. Randall Creighton, William G. Houf
Rok vydání:	1997
Předmět:	Materials science business.industry Nanotechnology CHEMKIN Chemical vapor deposition computer.software_genre Chemical reaction Chemical kinetics Software framework Etching (microfabrication) Physical chemistry Microelectronics Deposition (phase transition) business computer
Zdroj:	MRS Proceedings. 490
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-490-143
Popis:	Chemical reactions in the gas-phase and on surfaces are important in the deposition and etching of materials for microelectronic applications. A general software framework for describing homogeneous and heterogeneous reaction kinetics utilizing the Chemkin suite of codes is presented. Experimental, theoretical and modeling approaches to developing chemical reaction mechanisms are discussed. A number of TCAD application modules for simulating the chemically reacting flow in deposition and etching reactors have been developed and are also described.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a7808d7e6b430e9236213feefe0944f7 https://doi.org/10.1557/proc-490-143 Zobrazit plný text záznamu Full text from SpringerLink