Silicon test object of the linewidth of the nanometer range for SEM and AFM

Autor:	V. P. Gavrilenko, Yu. V. Ozerin, Yu. A. Novikov, A. V. Rakov, P. A. Todua
Rok vydání:	2007
Předmět:	Microscope Silicon Scanning electron microscope business.industry Physics::Optics chemistry.chemical_element law.invention Laser linewidth Nanolithography Optics chemistry law Calibration Nanometre Electron microscope business
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
Popis:	The results of the study of a test object on scanning electron microscopes and atomic force microscopes are presented. The test object presents a relief on a monosilicon surface, and it is fabricated by the anisotropic etching of monosilicon. The relief elements have a trapezoidal profile with large angles of inclination of the sidewalls. The sides of the relief elements coincide with the crystallographic planes {100} and {111} of silicon. The test object is intended for calibration of scanning electron microscopes and atomic force microscopes.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a7655e1058756c748f1fed7d76f6e106 https://doi.org/10.1117/12.733134 Zobrazit plný text záznamu