C60 films as etching masks for creation of micrometer and submicrometer YBa2Cu3O7 structures
| Autor: | Marianna Španková, J. Vincenc Oboňa, Stefan Chromik, Zs. Őszi, Ivan Kostic |
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| Rok vydání: | 2006 |
| Předmět: |
Superconductivity
Materials science business.industry Energy Engineering and Power Technology Nanotechnology Electron Condensed Matter Physics Isotropic etching Electronic Optical and Magnetic Materials Resist Optoelectronics Dry etching Electrical and Electronic Engineering Ion beam etching Thin film Reactive-ion etching business |
| Zdroj: | Physica C: Superconductivity and its Applications. 435:37-40 |
| ISSN: | 0921-4534 |
| DOI: | 10.1016/j.physc.2006.01.014 |
| Popis: | We have developed a new technique for etching of high-temperature superconducting YBa 2 Cu 3 O 7 (YBCO) thin films using C 60 etching mask. The minimal pattern size 0.5 μm was reached in the process of the ion beam etching. Wet chemical etching in Br–ethanol using C 60 mask was successfully realized. In the case of the chemical etching as a mask we have a 400 nm thick patterned C 60 layer due its insolubility in Br–ethanol. The submicron patterning of the YBCO films, thick up to 600 nm, was realized using Ar ion beam etching through the patterned C 60 film. In this case, the C 60 mask, 600–800 nm thick, was created by lift off technique in PMMA electron resist. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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