Autor:	Stephen A. Campbell, Wayne L. Gladfelter, Jeffrey T. Roberts, Noel Hoilien, Ryan C. Smith
Rok vydání:	2010
Předmět:	Metal Silicon chemistry visual_art Inorganic chemistry visual_art.visual_art_medium Anhydrous chemistry.chemical_element General Medicine Chemical vapor deposition Deposition (chemistry) Metal nitrate
Zdroj:	ChemInform. 33
ISSN:	1522-2667 0931-7597
DOI:	10.1002/chin.200220010
Popis:	Modification of a low-pressure CVD reactor and the similar deposition chemistries of Ti(NO3)4, Sn(NO3)4, and Hf(NO3)4 allowed the growth of films on silicon exhibiting a compositional spread of the...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a743aa49f02633086e5782eb4d4c0736 https://doi.org/10.1002/chin.200220010 Zobrazit plný text záznamu Plný text