Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces
| Autor: | Senri Ojima, Masayuki Toda, Kazuki Kubo, Masayuki Kato, Tadahiro Ohmi |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Silicon
Renewable Energy Sustainability and the Environment Chemistry Radical Wet cleaning chemistry.chemical_element Condensed Matter Physics Photochemistry Surfaces Coatings and Films Electronic Optical and Magnetic Materials Adsorption Environmental chemistry Excited state Materials Chemistry Electrochemistry Hydrocarbon contamination Wafer Excitation |
| Zdroj: | Journal of The Electrochemical Society. 144:1482-1487 |
| ISSN: | 1945-7111 0013-4651 |
| Popis: | Conditions to remove contaminations adsorbed on a surface in wet cleaning processes have to be perfectly controlled. Megasonic excitation of ozonized water removes hydrocarbon contamination from silicon surfaces. When ozonized water was excited by megasonics at a frequency of about 1 MHz, OH radicals were produced in the cleaning solution. As a result, we have shown that hydrocarbons on the wafer surface were oxidized by OH radicals, leading to hydrocarbon-free Si surfaces. |
| Databáze: | OpenAIRE |
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