In-situ XPS analysis of oxidized and reduced plasma deposited ruthenium-based thin catalytic films
| Autor: | Wiktor Redzynia, Jacek Tyczkowski, Jacek Balcerzak |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Hydrogen Inorganic chemistry General Physics and Astronomy chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces General Chemistry 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Oxygen Redox 0104 chemical sciences Surfaces Coatings and Films Catalysis Ruthenium Metal X-ray photoelectron spectroscopy chemistry visual_art visual_art.visual_art_medium Thin film 0210 nano-technology |
| Zdroj: | Applied Surface Science. 426:852-855 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2017.07.248 |
| Popis: | A novel in-situ study of the surface molecular structure of catalytically active ruthenium-based films subjected to the oxidation (in oxygen) and reduction (in hydrogen) was performed in a Cat-Cell reactor combined with a XPS spectrometer. The films were produced by the plasma deposition method (PEMOCVD). It was found that the films contained ruthenium at different oxidation states: metallic (Ru0), RuO2 (Ru+4), and other RuOx (Ru+x), of which content could be changed by the oxidation or reduction, depending on the process temperature. These results allow to predict the behavior of the Ru-based catalysts in different redox environments. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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