Ablation of silica glass using pulsed laser plasma soft X-rays

Autor:	Tetsuya Makimura, Kouichi Murakami, Youichi Kenmotsu, Hisao Miyamoto, Hiroyuki Niino
Rok vydání:	2005
Předmět:	Pulsed laser X-ray absorption spectroscopy Materials science business.industry medicine.medical_treatment Pulse duration Surfaces and Interfaces Plasma Condensed Matter Physics Ablation Fluence Surfaces Coatings and Films Boiling point Optics Materials Chemistry medicine Irradiation business
Zdroj:	Surface Science. 593:248-251
ISSN:	0039-6028
Popis:	We have investigated ablation of silica glass using pulsed laser plasma soft X-rays. For generating a plasma that emits pulsed soft X-rays, a Ta target was irradiated with focused 532 nm Nd:YAG laser light with a pulse duration of 7 ns at a fluence of 10 4 J/cm 2 . The soft X-rays were focused on the surfaces of silica glass using a Au-coated ellipsoidal mirror. The energy density of the soft X-rays can be roughly estimated to be 0.1 J/cm 2 , which is sufficiently enough for heating silica glass beyond the boiling point. We found that silica glass is smoothly ablated at 40 nm/shot. The processes induced by X-ray irradiation have been discussed based on transient-absorption measurements after X-ray irradiation.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a57e7f7666f615e0003b5ed26bb0ec71 https://doi.org/10.1016/j.susc.2005.06.067 Zobrazit plný text záznamu Full Text from ScienceDirect