Studies of topological features of the surface relief formation of titanium nitride films on silicon substrates during the diffusion mass transfer and on annealing using scanning tunneling microscopy
| Autor: | M. A. Tsysar |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Materials science
Surface relief Silicon Annealing (metallurgy) Deformation theory chemistry.chemical_element Nanotechnology Titanium nitride law.invention Inorganic Chemistry chemistry.chemical_compound Wavelength chemistry law Mass transfer General Materials Science Scanning tunneling microscope Composite material |
| Zdroj: | Journal of Superhard Materials. 35:42-49 |
| ISSN: | 1934-9408 1063-4576 |
| DOI: | 10.3103/s106345761301005x |
| Popis: | The special features of the structure and properties of nanostructural titanium nitride films on silicon substrates have been considered and a physicomathematical model of the formation of their surface relief has been constructed on the basis of the deformation theory. A dependence of the wavelength of the surface corrugation on the film thickness has been established. The topography of the surface relief formed as a result of a diffusion mass transfer and changed on annealing has been examined. The amplitude of corrugations formed has been defined. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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