Morphology and magnetism of CoPd coverage on MoS2 flakes/SiO2
| Autor: | Chuan Che Hsu, Wen Chin Lin, Chak Ming Liu, Zong You Lin |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Photoluminescence
Materials science Magnetic domain Mechanical Engineering Metals and Alloys Analytical chemistry Nanoparticle 02 engineering and technology Coercivity 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Evaporation (deposition) 0104 chemical sciences Hysteresis Mechanics of Materials Materials Chemistry Thin film Magnetic alloy 0210 nano-technology |
| Zdroj: | Journal of Alloys and Compounds. 785:436-444 |
| ISSN: | 0925-8388 |
| Popis: | CoPd alloy nanostructures and thin films were deposited on MoS2 flakes through e-beam evaporation at a high temperature (HT) (500 K) and at room temperature (RT) (300 K). In HT growth, CoPd nanoparticles assembled at the edge of the MoS2 flake. The nanoparticles formed parallel chains at the edge of each layer in multilayered MoS2. As indicated by the quenched photoluminescence, HT deposition resulted in a flat CoPd coverage with a roughness of ≤ ± 0.5 nm on a MoS2 terrace. By contrast, RT growth led to a relatively rough CoPd thin film on MoS2 (roughness ≤ ± 2 nm). The film comprised a merged nanoparticle assembly. The MoS2/SiO2 step edge played a crucial role in magnetic domain pinning such that the magnetic coercivity (Hc) of Pd/Co/MoS2 was smaller than that of Pd/Co/SiO2. Similarly, RT CoPd (8 nm)/MoS2 exhibited a parallelogram-shaped hysteresis loop with a relatively small Hc value compared with that of the square hysteresis loops of RT CoPd (8 nm)/SiO2. The hydrogenation of RT CoPd (8 nm)/MoS2 resulted in reversible Hc enhancement. |
| Databáze: | OpenAIRE |
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