Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing
| Autor: | Xiangxiang Cui, Zhenyu Zhang, Shiqiang Yu, Xin Chen, Chunjing Shi, Hongxiu Zhou, Fanning Meng, Jiaxin Yu, Wei Wen |
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| Rok vydání: | 2023 |
| Předmět: | |
| Zdroj: | Nanoscale. |
| ISSN: | 2040-3372 2040-3364 |
| DOI: | 10.1039/d3nr01149f |
| Popis: | Schematic diagram of the CMP polishing mechanism for silicon. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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