Investigation of parameters of inductively coupled plasma and its use in steel nitriding
| Autor: | Andrey V. Kaziev, E. A. Meshcheryakova, T. V. Stepanova, A. A. Pisarev, M. M. Berdnikova, M. M. Kharkov, M. Zibrov |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Analytical chemistry General Physics and Astronomy Biasing 02 engineering and technology Plasma Partial pressure 021001 nanoscience & nanotechnology 01 natural sciences Hardness symbols.namesake 0103 physical sciences symbols Langmuir probe Inductively coupled plasma Total pressure 0210 nano-technology Nitriding |
| Zdroj: | Bulletin of the Russian Academy of Sciences: Physics. 80:175-179 |
| ISSN: | 1934-9432 1062-8738 |
| Popis: | Parameters of inductively coupled plasma (ICP) discharges in a mixture of gases N2, H2, and Ar at a total pressure of 1.5 × 10–3 mbar and a partial pressure ratio N2: H2: Ar = 2: 12: 1 are discussed. The plasma properties are analyzed using Langmuir probes and optical emission spectroscopy. The ICP discharge is used for the nitriding of specimens made of Russian grade 30ChGSA structural steel. The nitriding experiments are performed at different bias voltages Vb in the range of–200 V to +100 V with respect to the walls of the discharge chamber. The surface hardness of the treated specimens depends substantially on the bias voltage, being much higher than the initial value in all cases. The obtained results demonstrate the possibility of increasing the surface hardness up to 1000 HV (4–5 times the initial values) at the bias voltage equal to the floating potential. |
| Databáze: | OpenAIRE |
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