Surface Modification of Pb1 – xSnxSe Films during Plasma Treatment Near the Sputtering Threshold

Autor: K. E. Guseva, V. V. Naumov, I. I. Amirov, S. P. Zimin
Rok vydání: 2020
Předmět:
Zdroj: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques. 14:1174-1178
ISSN: 1819-7094
1027-4510
DOI: 10.1134/s1027451020050213
Popis: The processes of the plasma sputtering of epitaxial lead-tin selenide films near the sputtering threshold are studied. Pb1 – xSnxSe films (x = 0.03, 0.07) with a thickness of 0.5–2 microns are grown by molecular-beam epitaxy on CaF2/Si(111) substrates. The films are plasma treated with radio-frequency high-density low-pressure inductively coupled argon plasma with an ion energy of 20–25 eV at typical process times of 60–360 s. As a result of plasma treatment for a prolonged period, the formation of hollow metal particles of nano- and submicron sizes is observed on the surface. Using scanning electron microscopy methods, it is shown that the lateral dimensions of the obtained structures, their shape and surface density vary over wide ranges and significantly depend on the time of plasma sputtering. The features of plasma sputtering for the studied films and films of a binary compound of lead selenide are compared.
Databáze: OpenAIRE
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