Application aspects of a positive tone deep UV resist
| Autor: | Horst Wengenroth, Horst Röschert, Walter Spiess, Georg Pawlowski |
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| Rok vydání: | 1993 |
| Předmět: |
Depth of focus
Materials science business.industry Thermal resistance Linearity Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Matrix (chemical analysis) Anti-reflective coating Resist law Optoelectronics Electrical and Electronic Engineering business Lithography Dissolution |
| Zdroj: | Microelectronic Engineering. 21:267-270 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(93)90070-l |
| Popis: | Current state of process capabilities and performance items of a recently developed chemically amplified positive tone deep UV (DUV) resist is presented. The material is based on three components: an α, α-bis (arylsulfonyl) diazomethane as phtoacid generator (PAG), an oligomeric N,O-acetal as dissolution inhibitor and a poly(vinylphenol) as matrix resin. Lithography aspects being of general interest to the process engineer such as resolution, linearity, exposure and development latitudes, depth of focus, thermal resistance and use of top antireflective coating (TARC) AZ Aquatar are addressed. Furthermore, progress in delay time stability is discussed. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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