| Autor: |
Daan van Eijk, Wouter Mulckhuyse, Peter van der Walle, Jacques van der Donck, Sandro Hannemann |
| Rok vydání: |
2014 |
| Předmět: |
|
| Zdroj: |
Metrology, Inspection, and Process Control for Microlithography XXVIII. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.2048684 |
| Popis: |
The background in simple dark field particle inspection shows a high scatter variance which cannot be distinguished from signals by small particles. According to our models, illumination from different azimuths can reduce the background variance. A multi-azimuth illumination has been successfully integrated on the Rapid Nano particle scanner. This illumination method reduces the variance of the background scattering on substrate roughness. It allows for a lower setting of the detection threshold, resulting in a more sensitive inspection system. By implementing this system the lower detection limit of the scanner was reduced from 59 nm to 42 nm LSE. A next improvement, a change of the inspection wavelength to 193 nm will bring the detection limit to sub 20 nm. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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