Metal-insulator transition in crystalline V2O3 thin films probed at atomic-scale using emission Mössbauer spectroscopy

Autor:	Einar B. Thorsteinsson, Haraldur P. Gunnlaugsson, K.Bharuth Ram, H.P. Gislason, T. E. Mølholt, D. Naidoo, Karl Johnston, B. Qi, Dmitry Zyabkin, Sveinn Olafsson, Hilary Masenda, Juliana Schell, Roberto Mantovan, P.B. Krastev, Unnar B. Arnalds, A. Tarazaga Martín-Luengo
Rok vydání:	2020
Předmět:	010302 applied physics Materials science Condensed matter physics Silicon Metals and Alloys chemistry.chemical_element 02 engineering and technology Surfaces and Interfaces 021001 nanoscience & nanotechnology 01 natural sciences Atomic units Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry 0103 physical sciences Mössbauer spectroscopy Materials Chemistry Strongly correlated material Metal–insulator transition Thin film 0210 nano-technology
Zdroj:	Thin Solid Films. 714:138389
ISSN:	0040-6090
DOI:	10.1016/j.tsf.2020.138389
Popis:	Microscopic understanding the metal-to-insulator transition (MIT) in strongly correlated materials is critical to the design and control of modern “beyond silicon” Mott nanodevices. In this work, the local MIT behaviors in single crystalline V2O3 thin films were probed on an atomic scale by online 57Fe emission Mossbauer spectroscopy (eMS) following dilute (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a2e55732765cc551708e6ad5a6791c9f https://doi.org/10.1016/j.tsf.2020.138389 Zobrazit plný text záznamu Full Text from ScienceDirect