Recent Advances in the Fabrication of Very Thick, Multistepped Iron and Tantalum Films for EOS Targets
| Autor: | S. C. Peterson, Paul B. Mirkarimi, K. A. Bettencourt, Nick Teslich |
|---|---|
| Rok vydání: | 2013 |
| Předmět: |
Nuclear and High Energy Physics
Fabrication Materials science 020209 energy Process improvement Tantalum chemistry.chemical_element Nanotechnology 02 engineering and technology engineering.material 01 natural sciences 010305 fluids & plasmas Stress (mechanics) Coating Sputtering 0103 physical sciences 0202 electrical engineering electronic engineering information engineering General Materials Science Civil and Structural Engineering business.industry Mechanical Engineering Nuclear Energy and Engineering chemistry High pressure engineering Optoelectronics business National Ignition Facility |
| Zdroj: | Fusion Science and Technology. 63:282-287 |
| ISSN: | 1943-7641 1536-1055 |
| DOI: | 10.13182/fst13-tfm20-34 |
| Popis: | The equation of state (EOS) and other parameters at high pressures and low temperatures are of significant interest. One example is iron, where knowledge of the EOS at high pressure is needed to understand planetary interiors and planetary development. Targets are needed to perform these important measurements on experimental platforms such as Omega, National Ignition Facility (NIF), and the Z-machine. There is a need for thicker films for targets for the NIF and Z-machine platforms, which is technically challenging because of coating stress and other issues. We present results showing that we successfully sputter deposited stepped iron and tantalum films up to 90+ μm thick for targets on NIF and have sputter deposited (unstepped) tantalum films over 1700 μm (1.7 mm!) thick, which are desired for targets for Z-machine EOS experiments. This is generally made possible by the low stress achieved in the tantalum films (as low as 25 MPa). We will also report some process improvement achievements, such ... |
| Databáze: | OpenAIRE |
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