Coater/developer-based techniques to improve high-resolution EUV patterning

Autor:	Kanzo Kato, Lior Huli, David Hetzer, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Satoru Shimura, Shinichiro Kawakami, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Takahiro Kitano, Seiji Nagahara, Akihiro Sonoda
Rok vydání:	2022
Zdroj:	International Conference on Extreme Ultraviolet Lithography 2022.
DOI:	10.1117/12.2642878
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a28a45c5dd27e45f08ae7af37c1ea4b4 https://doi.org/10.1117/12.2642878 Zobrazit plný text záznamu