DBD reactor design and optimization in continuous AP-PECVD from HMDSO/N2/N2O mixture
| Autor: | Hubert Caquineau, Petr Hotmar, Raphaël Cozzolino, Nicolas Gherardi |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science 02 engineering and technology Substrate (electronics) Dielectric barrier discharge Chemical vapor deposition 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Electronic Optical and Magnetic Materials Volumetric flow rate Clogging Chemical engineering Plasma-enhanced chemical vapor deposition 0103 physical sciences Deposition (phase transition) Thin film 0210 nano-technology Instrumentation |
| Zdroj: | The European Physical Journal Applied Physics. 73:20801 |
| ISSN: | 1286-0050 1286-0042 |
| DOI: | 10.1051/epjap/2016150525 |
| Popis: | Dielectric barrier discharge (DBD) deposition of thin films is increasingly studied as a promising alternative to other non-thermal processes such as low-pressure plasma-enhanced chemical vapor deposition (PECVD) or wet-coating. In this paper we demonstrate how optimizing gas injection in the DBD results in an improvement in the reactor performance. We propose to confine the precursor gas close to the deposition substrate by an additional gas flow. The performance of this design is studied though simulation of mass transport. To optimize the deposited thickness, gas cost and reactor clogging, we assess the influence of the confinement, total gas flow rate and DBD length. The confinement is found to reduce reactor clogging, even for long DBD, and increase the deposit thickness. This increase in thickness requires a proportionate increase in the gas flow-rate, making the gas-cost the main limitation of the proposed design. We show, however, that by fine-tuning the operating conditions a beneficial compromise can be obtained between the three optimization objectives. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|