Critical Dimension Measurement Using OCD Spectroscopy for Gate and STI AEI Structures

Autor:	Yaoming Shi, Yi Huang, Charles Lee, Huiping Chen, Jiang-Tao Dang, Zhang Zhensheng, Hai-Jun Gao, Hai-Tao Li, Yiping Xu, Yong-Gang Feng
Rok vydání:	2012
Předmět:	Chemistry business.industry Electrical engineering Spectroscopy business Engineering physics Critical dimension
Zdroj:	ECS Transactions. 44:1169-1174
ISSN:	1938-6737 1938-5862
Popis:	In this work, optical critical dimension (OCD) spectroscopy was used to monitor the critical dimension for gate and STI AEI (After-Etch Inspection) structures. The reference measurements with CD-SEM (CD Scanning Electron Microscope) and TEM (Transmission Electron Microscopy) were also carried out. The OCD results show high precision, high stability and good correlation. This work demonstrates the capability of the OCD as an important metrology technique for IC process control.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a1d53f3c59ea46a2ce61032cdcbbaa1f https://doi.org/10.1149/1.3694445 Zobrazit plný text záznamu