Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process
| Autor: | M. Muralidhar Singh, M.S. Krupashankara, T N Shridhar, G. Vijaya, B.K. Sridhara |
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| Rok vydání: | 2018 |
| Předmět: |
0209 industrial biotechnology
Materials science chemistry.chemical_element 02 engineering and technology engineering.material Nanoindentation Sputter deposition 021001 nanoscience & nanotechnology 020901 industrial engineering & automation Coating chemistry Aluminium visual_art visual_art.visual_art_medium engineering Surface roughness Deposition (phase transition) Ceramic Thin film Composite material 0210 nano-technology |
| Zdroj: | Materials Today: Proceedings. 5:2696-2704 |
| ISSN: | 2214-7853 |
| DOI: | 10.1016/j.matpr.2018.01.050 |
| Popis: | Aluminium (Al) thin film deposited using DC Magnetron sputtering combines many properties such as Optical, Mechanical properties on ceramic substrates .Properties of thin film coating depend on the deposition parameters employed. The aim of this work was to study the optical and mechanical properties of aluminium thinfilms. In order to study the above property deposition parameters varied with different deposition rate, power and argon flow rate in the DC magnetron sputtering process on substrates. The films were characterized by atomic force microscope, UV VIS NIR spectrophotometer, thickness profiler and nano mechanical testing system. The surface morphology of the film was examined by atomic force microscope shows the dense and uniform nanostructures with increased surface roughness from 4 to 21 nm with increasing argon flow. UV-VIS-NIR Spectrophotometer analysis indicates higher reflectance for all the films in the wavelength range of 250 nm to 2500 nm. Nano indentation study revealed that there was a considerable change in hardness values of the films prepared at different conditions. |
| Databáze: | OpenAIRE |
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