Surface morphology after low coverage Pt deposition on Cu(110)

Autor:	Christophe de Beauvais, Markus B. Hugenschmidt
Rok vydání:	1994
Předmět:	Diffraction Morphology (linguistics) Chemistry Scattering Analytical chemistry Surfaces and Interfaces Atmospheric temperature range Condensed Matter Physics Surfaces Coatings and Films Crystallography Phase (matter) Atom Materials Chemistry Deposition (chemistry) Dissolution
Zdroj:	Surface Science. :455-459
ISSN:	0039-6028
DOI:	10.1016/0039-6028(94)90436-7
Popis:	The morphology of a Cu(110) surface after low coverage Pt atom deposition from the vapour phase is studied with thermal energy atom scattering (TEAS) in the temperature range of 200–800 K. Both cross section measurements and diffraction analysis reveal different structures. At low temperatures, isolated defects containing a metal adatom are observed. Between 350 and 650 K, experimental results suggest that these aggregates are dissociated, leaving behind them an almost flat surface patch with an incorporated Pt atom. Above 650 K, bulk dissolution of Pt occurs.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a18126ed34fc1c98863fac96c3df062d https://doi.org/10.1016/0039-6028(94)90436-7 Zobrazit plný text záznamu