Effects of nitrogen pressure and pulse bias voltage on the properties of Cr–N coatings deposited by arc ion plating
ISSN: | 0257-8972 |
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Přístupová URL adresa: | https://explore.openaire.eu/search/publication?articleId=doi_________::a14fb61e168a19247f948dafedc35b3e https://doi.org/10.1016/j.surfcoat.2009.11.021 |
Rights: | CLOSED |
Přírůstkové číslo: | edsair.doi...........a14fb61e168a19247f948dafedc35b3e |
Autor: | X. S. Wan, Chao Sun, Yeran Yang, Sumei Zhao, Jun Gong |
Rok vydání: | 2010 |
Předmět: |
Materials science
Ion plating Metallurgy Evaporation Analytical chemistry Biasing Surfaces and Interfaces General Chemistry engineering.material Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound chemistry Coating X-ray photoelectron spectroscopy Materials Chemistry Melting point engineering Thin film Chromium nitride |
Zdroj: | Surface and Coatings Technology. 204:1800-1810 |
ISSN: | 0257-8972 |
Popis: | Cr-N coatings were deposited on 1Cr18Ni9Ti stainless steel in the pure N(2) atmosphere by arc ion plating (AIP). The relationships between deposition parameters and coating properties were investigated. X-ray diffraction showed a phase transformation from CrN+Cr(2)N+Cr-->CrN+Cr-->CrN and the CrN preferred orientation changed from (200) to (220) as N(2) pressure increased. Increasing bias voltage led to CrN preferred orientation changed from (200) to (220) and the formation of Cr(2)N. XPS results indicated that chemical composition of the coatings changed as N(2) pressure increased but it changed little with bias voltage. The lower melting point of chromium nitride formed on target surface induced the increase of macroparticles and deposition rate with increasing N(2) pressure; and bias voltage had an obvious effect on reducing macroparticles of the Cr-N coatings. Residual stresses were measured by substrate curvature technique, and the changing tendency coincided with the microhardness of the coatings. (C) 2009 Elsevier B.V. All rights reserved. |
Databáze: | OpenAIRE |
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