Blue laser lithography for making antireflective submicron structures on silicon
| Autor: | Shih-Wei Chen, Chin-Tien Yang, Rung-Ywan Tsai, Chung-Ta Cheng, Shuen-Chen Chen, Wen-Haw Lu, Chun-Chieh Huang |
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| Rok vydání: | 2013 |
| Předmět: |
Blue laser
Materials science Silicon business.industry chemistry.chemical_element Atomic and Molecular Physics and Optics law.invention Anti-reflective coating Optics chemistry Resist law Optoelectronics X-ray lithography sense organs Crystalline silicon business Lithography Next-generation lithography |
| Zdroj: | Optical Review. 20:185-188 |
| ISSN: | 1349-9432 1340-6000 |
| DOI: | 10.1007/s10043-013-0031-4 |
| Popis: | The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup head and consisting of a 405-nm-wavelength blue laser and a 0.85-numerical-aperture objective lens. Si substrates were patterned with submicron column patterns of various periods and aspect ratios by blue laser lithography using a sputtered Ge-Sb-Sn-O layer as a resist. The reflectance of the patterned Si substrate decreased to 3% on average in the 300–1000 nm wavelength range, with a low sensitivity to the angle of incident light. Such patterned substrates showed potential for application in crystalline Si solar cells. |
| Databáze: | OpenAIRE |
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