Influence of the Deposition Temperature on the Structure of Thin Molybdenum Disulfide Films Formed by Chemical Vapor Deposition

Autor:	S. E. Aleksandrov, Vladimir V. Fedorov, O. Yu. Koval, Y. Khattab
Rok vydání:	2021
Předmět:	chemistry.chemical_compound chemistry Chemical engineering General Chemical Engineering General Chemistry Chemical vapor deposition Molybdenum disulfide Deposition temperature
Zdroj:	Russian Journal of Applied Chemistry. 94:1044-1051
ISSN:	1608-3296 1070-4272
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::a0ef8aed8c8a4880b9b8014f4558d14b https://doi.org/10.1134/s1070427221080048 Zobrazit plný text záznamu Full text from SpringerLink