Preparation and characterization of Al 2x In 2−2x O 3 films deposited on MgO (1 0 0) by MOCVD

Autor: Xuejian Du, Zhao Li, Cansong Zhao, Jin Ma, Xianjin Feng, Wei Mi, Caina Luan
Rok vydání: 2015
Předmět:
Zdroj: Materials Research Bulletin. 67:14-19
ISSN: 0025-5408
Popis: Highlights: • Ternary Al{sub 2x}In{sub 2−2x}O{sub 3} alloy films were deposited on MgO (1 0 0) by MOCVD. • The microstructure of the Al{sub 2x}In{sub 2−2x}O{sub 3} films were studied upon HRTEM. • Al{sub 2x}In{sub 2−2x}O{sub 3} alloy films exhibited great optical transparency in the visible wavelength range. • The band gap of the Al{sub 2x}In{sub 2−2x}O{sub 3} films can be modulated by controlling the Al contents in the samples. - Abstract: The ternary Al{sub 2x}In{sub 2−2x}O{sub 3} films with different compositions x[Al/(Al + In) atomic ratio] have been fabricated on the MgO (1 0 0) substrates by the metal organic chemical vapor deposition (MOCVD) method. The influence of different Al contents on the structural, optical and electrical properties of Al{sub 2x}In{sub 2−2x}O{sub 3} films has been studied. The structural studies reveal a change from single crystalline structure of cubic In{sub 2}O{sub 3} to amorphous as the Al content increases. The average transmittances of all samples in the visible range are over 80%. The optical band gap is observed to increase monotonically from 3.67 to 5.38 eV as the Al content increases from 0.1 to 0.9.
Databáze: OpenAIRE