Contact Properties between Low-Resistive Al-Based Source/Drain and InOx in Top-Gate Bottom-Contact Oxide Thin-Film Transistor for Application to the Vertical-TFT

Autor: Sori Jeon, Kwang-Heum Lee, Seung-Hee Lee, Chi-Sun Hwang, Sang-Hee Ko Park
Rok vydání: 2019
Předmět:
Zdroj: Proceedings of the International Display Workshops. :570
ISSN: 1883-2490
DOI: 10.36463/idw.2019.0570
Databáze: OpenAIRE