Improved Liquid Source Vaporization for CVD & ALD Precursors
| Autor: | Hongxu Duan, Eric Ellsworth, Thuc Dinh, Kathleen Erickson |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Fabrication Liquid vapor Vapor pressure business.industry 020209 energy Thermal decomposition Nanotechnology 02 engineering and technology 021001 nanoscience & nanotechnology Physics::Fluid Dynamics Condensed Matter::Soft Condensed Matter Vaporization 0202 electrical engineering electronic engineering information engineering Microelectronics Delivery system 0210 nano-technology business Small window |
| Zdroj: | 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). |
| DOI: | 10.1109/asmc.2019.8791829 |
| Popis: | Many of the advanced gas-phase processes used in state-of-the art microelectronic fabrication place higher demands on liquid vapor delivery solutions. Vaporization challenges include a diverse range of liquids with unique material properties, the use of liquids with low vapor pressure or the use of liquids with a small window between thermal decomposition and vaporization. The growing implementation of short pulse processing also creates a need for faster response times. The Performance Enhanced Turbo-VaporizerTM Liquid Delivery System presents a new alternative for liquid vaporization. |
| Databáze: | OpenAIRE |
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