ChemInform Abstract: Anodic Niobium Pentoxide Films: Growth and Thickness Determination by in situ Optoelectrochemical Measurements
Autor: | N. L. Dias, J. F. Julião, J. W. R. Chagas, H. L. Cesar, U. U. Gomes, Franco Decker |
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Rok vydání: | 2010 |
Předmět: | |
Zdroj: | ChemInform. 22 |
ISSN: | 0931-7597 |
DOI: | 10.1002/chin.199138018 |
Popis: | Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4 (1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 A V−1 was verified. |
Databáze: | OpenAIRE |
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