Nanografting of Silanes on Silicon Dioxide with Applications to DNA Localization and Copper Electroless Deposition

Autor:	Michael V. Lee, Laurie Hutchins, John N. Harb, Jonathan C. Blood, Samuel T. Cosby, Robert C. Davis, Matthew R. Linford, Adam T. Woolley, Kyle A. Nelson, Dean R. Wheeler, Hector A. Becerril
Rok vydání:	2007
Předmět:	Silanes Materials science Silicon dioxide General Chemical Engineering Inorganic chemistry chemistry.chemical_element General Chemistry Copper Contact angle chemistry.chemical_compound Chemical species chemistry X-ray photoelectron spectroscopy Monolayer Materials Chemistry Palladium
Zdroj:	Chemistry of Materials. 19:5052-5054
ISSN:	1520-5002 0897-4756
DOI:	10.1021/cm071442d
Popis:	We report the first, successful, partial nanoshaving of octadecyl- and octyl-dimethylmonochlorosilane monolayers on silicon dioxide, as well as nanografting of perfluorinated and aminosilanes on these substrates, using an atomic force microscopy (AFM) tip. Even partial nanografting of aminosilane patterns can be used for DNA localization or for binding palladium ions to serve as seeds for electroless deposition of copper lines. That is, even the substitution of a small fraction of chemical species at a surface during nanografting primes the surface to allow significant chemical changes to occur in subsequent processing steps. We characterize our surfaces using AFM, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, and contact angle goniometry.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::9fa52871eab5d077e0c10faec1159a48 https://doi.org/10.1021/cm071442d Zobrazit plný text záznamu